Headquartered within steps of the USPTO with an affiliate office in Tokyo, Oblon is one of the largest law firms in the United States focused exclusively on intellectual property law.
1968
Norman Oblon with Stanley Fisher and Marvin Spivak launched what was to become Oblon, McClelland, Maier & Neustadt, LLP, one of the nation's leading full-service intellectual property law firms.
Outside the US, we service companies based in Japan, France, Germany, Italy, Saudi Arabia, and farther corners of the world. Our culturally aware attorneys speak many languages, including Japanese, French, German, Mandarin, Korean, Russian, Arabic, Farsi, Chinese.
Oblon's professionals provide industry-leading IP legal services to many of the world's most admired innovators and brands.
From the minute you walk through our doors, you'll become a valuable part of a team that fosters a culture of innovation, client service and collegiality.
The United States Patent and Trademark Office (USPTO) issued final rules implementing the inventor's oath or declaration provisions of the America Invents Act (AIA) on August 14, 2012.
Les Nouvelles - Licensing Executives Society International (LESI)
November 11, 2024
October 9-10, 2024 in Tokyo and Osaka
Jay E. Rowe Jr., Ph.D., is a Senior Patent Agent in the firm’s Chemical Patent Prosecution group, writing and revising patent applications and representing clients before the United States Patent and Trademark Office (USPTO), from filing to allowance.
Dr. Rowe has 25 years of hands-on experience in organic synthesis and process chemistry, serving as a former research chemist, Director of Research and Development, and Vice President of Operations for several specialty chemical companies. He is the inventor of three patents directed to textile dyes and liquid dye compositions. While earning his Ph.D. in organic chemistry, his thesis work focused on the study of photochemistry and related synthetic organic processes. He earned a Master of Business Administration while working in the specialty chemicals industry.